全部文献期刊学位论文会议报纸专利标准年鉴图书|学者科研项目
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作者:S Hofmann , B T J van Ham ...
来源:[J].New Journal of Physics(IF 4.063), 2014, Vol.16 (12)IOP
摘要:The effluent of an RF argon atmospheric pressure plasma jet, the so-called kinpen, is investigated with focus on the nitric-oxide (NO) distribution for laminar and turbulent flow regimes. An additional dry air gas curtain is applied around the plasma effluent to prevent interacti...
作者:A Zalar , S Hofmann , P Panjan
来源:[J].Vacuum(IF 1.53), 1997, Vol.48 (7), pp.625-627Elsevier
摘要:Abstract(#br)In order to study the reactivity of Si Me interfaces, seven model thin-film systems with Me = Al , Ni , Co , Cr , Zr , Mo or W and with a total thickness between 110 and 200 nm were prepared by sputter deposition on smooth Si(111) substrates. The samples were he...
作者:S Hofmann , F Pimentel ...
来源:[J].Vacuum(IF 1.53), 1995, Vol.46 (8), pp.1077-1081Elsevier
摘要:Abstract(#br)The beginning of interfacial reactions at the Si/Me and Me/Me interfaces of thin-film structures (Me = Ni, Cr, or Al) was studied. To activate and to control the reactions, most of the samples were dynamically heated in a differential scanning calorimeter (DSC) ...
作者:S Hofmann , R Brandenburg
来源:[J].Journal of Physics D: Applied Physics(IF 2.528), 2014, Vol.47 (22)IOP
摘要:A molecular beam mass spectrometer has been calibrated and used to measure the air entrainment, nitric oxide and ozone concentrations in the effluent of a cold atmospheric pressure argon RF driven plasma jet. The approaches for calibrating the mass spectrometer for different...
作者:S Hofmann , M.G Itkis ...
来源:[J].Nuclear Inst. and Methods in Physics Research, A(IF 1.142), 2003, Vol.516 (2), pp.529-538Elsevier
摘要:Abstract(#br)Within the past 15 years, the recoil separator VASSILISSA has been used for the investigations of evaporation residues produced in complete fusion reactions induced by heavy ions. The study of decay properties and formation of cross-sections of the isotopes of e...
作者:S Hofmann , K Yoshihara
来源:[J].Applied Surface Science(IF 2.112), 1999, Vol.144, pp.310-314Elsevier
摘要:Abstract(#br)Depth resolution, roughness and atomic mixing parameters in sputter depth profiling with AES were studied on GaAs/AlAs multilayers in dependence of the type of sputtering gas (Ar, Xe, SF 6 ), the ion energy and the ion incidence angle, using the mixing–roughness...

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