全部文献期刊学位论文会议报纸专利标准年鉴图书|学者科研项目
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作者:Darwin Joseph R. , Palanisamy Chinnathambi Selvaraj
来源:[J].International Journal of Business Administration, 2015, Vol.6 (2)Sciedu出版社
摘要:Workforce diversity has been identified as one of the strategic capabilities that will add value to the organizations over their competition. As Singapore is one of the most globally competitive countries, it attracts highly skilled and extremely innovative people to work he...
作者:PALANISAMY CHINNATHAMBI SELVARAJ;SIRIWARDANE HARESH
来源:[P].US201213478292 2013-11-28  CNKI
摘要:The invention provides a chemical-mechanical polishing composition containing wet-process silica, an oxidizing agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing a subs...
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作者:PALANISAMY CHINNATHAMBI SELVARAJ;SIRIWARDANE HARESH
来源:[P].WO2013US42168 2013-11-28  CNKI
摘要:The invention provides a chemical-mechanical polishing composition containing wet-process silica, an oxidizing agent that oxidizes nickel-phosphorous, a chelating agent, polyvinyl alcohol, and water. The invention also provides a method of chemically-mechanically polishing a subs...
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作者:PALANISAMY CHINNATHAMBI SELVARAJ (SG);YEUNG PING-HA (SG);REISS BRIAN (US)
来源:[P].US20080970978 2009-7-9  CNKI
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作者:PALANISAMY CHINNATHAMBI SELVARAJ (SG);YEUNG PING-HA (SG);REISS BRIAN (US)
来源:[P].US20080970978 2009-07-09  CNKI
摘要:The invention provides a chemical-mechanical polishing composition consisting essentially of flumed alumina, alpha alumina, silica, a nonionic surfactant, an additive compound selected from the group consisting of glycine, alanine, iminodiacetic acid, and maleic acid, hydrogen pe...
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作者:PALANISAMY CHINNATHAMBI SELVARAJSIRIWARDANE HARES
来源:[P].US20090364937 2010-08-05  CNKI
摘要:The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel-phosphorous, oxalic acid, optionally, tartaric acid, optionally, a nonionic surfactant, optionally, a biocide, and water. Th...
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作者:PALANISAMY CHINNATHAMBI SELVARAJSIRIWARDANE HARES
来源:[P].WO2010US22312 2010-08-12  CNKI
摘要:The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel phosphorous, oxalic acid, optionally, tartaric acid, optionally, a nonionic surfactant, optionally, a biocide, and water. Th...
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作者:PALANISAMY CHINNATHAMBI SELVARAJSIRIWARDANE HARES
来源:[P].WO2010US37158 2010-12-09  CNKI
摘要:The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel phosphorous, a complexing agent, and water. The invention also provides a method of chemically-mechanically polishing a subs...
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作者:PALANISAMY CHINNATHAMBI SELVARAJSIRIWARDANE HARES
来源:[P].US20090364937 2012-07-24  CNKI
摘要:The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel-phosphorous, oxalic acid, optionally, tartaric acid, optionally, a nonionic surfactant, optionally, a biocide, and water. Th...
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作者:PALANISAMY CHINNATHAMBI SELVARAJSIRIWARDANE HARES
来源:[P].US201213546128 2012-11-01  CNKI
摘要:The invention provides a chemical-mechanical polishing composition comprising alpha alumina, fumed alumina, silica, an oxidizing agent that oxidizes nickel-phosphorous, oxalic acid, optionally, tartaric acid, optionally, a nonionic surfactant, optionally, a biocide, and water. Th...
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