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来源:[C].Optical Engineering + Applications2018SPIE
摘要:This PDF file contains the front matter associated with SPIE Proceedings Volume 10753, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.
来源:[C].Optical Engineering + Applications2018SPIE
摘要:This PDF file contains the front matter associated with SPIE Proceedings Volume 10751, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.
作者:Jens Seyfert , Lars Albinus , Jens Arnold ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:A fundamental aspect for the economic success of a semiconductor production is a low level of costs per wafer. A substantial part of these costs per wafer is accounted by personnel costs. For this reason, it is desirable to reach the lowest possible level of personnel costs....
作者:Jonathan Pradelles , Yoann Blancquaert , Stefan Landis ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:Operating maskless, massively parallel electron beam direct write (MEBDW) is an attractive alternative to optical lithography in micro and nano device manufacturing. Mapper Lithography develops MEBDW tools able to pattern wafers, for application nodes down to 28nm, with a th...
作者:Amandine Pizzagalli
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:Lithography requirements for Advanced Packaging & MEMS are very different compared to mainstream semiconductor industries’ needs. Even if the market entry barrier is much lower in the “More than Moore” market, customer adoptions needs are higher in the packaging area wi...
作者:Jérôme Reche , Maxime Besacier , Patrice Gergaud ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:Currently, Line Edge Roughness (LER) and Line Width Roughness (LWR) control presents a huge challenge for the lithography step in microelectronic industries. For advanced nodes, this morphological aspect reaches the same order of magnitude than the Critical Dimension, which leads...
作者:Jens Schneider , Dieter Kaiser , Nicolo Morgana ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:Grayscale lithography is a well-known technique for three dimensional structuring of a photo sensitive material. The 3D structuring of the photoresist is performed by a spatially variable exposure. Pixelated grayscale mask structures are defined to achieve the desired 3D resist p...
作者:Andrea Leserri , Francesco Ferrario , Umberto Iessi ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:Photolithography masks require a periodical inspection and cleaning. The visual inspection is often paired with a mask air blowing to remove eye visible particles. If these steps are run manually they are really critical for mask integrity in terms of contaminations, scratch...
作者:H. Teyssedre , P. Quemere , J. Chartoire ...
来源:[C].European Mask and Lithography Conference2018SPIE
摘要:In this paper the bias table models for the wafer scale SmartNIL™ technology are addressed and validated using complete Scanning Electron Microscopy (SEM) characterizations and polynomial interpolation functions. Like the other nanoimprint lithography (NIL) technics, this re...
来源:[C].Optical Engineering + Applications2018SPIE
摘要:This PDF file contains the front matter associated with SPIE Proceedings Volume 10752, including the Title Page, Copyright information, Table of Contents, and Conference Committee listing.

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